Atomic Layer Deposition of ZrO2 on Titanium Inhibits Bacterial Adhesion and Enhances Osteoblast Viability
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چکیده
منابع مشابه
Atomic layer deposition and properties of ZrO2/Fe2O3 thin films
Thin solid films consisting of ZrO2 and Fe2O3 were grown by atomic layer deposition (ALD) at 400 °C. Metastable phases of ZrO2 were stabilized by Fe2O3 doping. The number of alternating ZrO2 and Fe2O3 deposition cycles were varied in order to achieve films with different cation ratios. The influence of annealing on the composition and structure of the thin films was investigated. Additionally, ...
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ژورنال
عنوان ژورنال: International Journal of Nanomedicine
سال: 2021
ISSN: 1178-2013
DOI: 10.2147/ijn.s298449